The Occupational and Environmental Exposures of Skin to Chemicals (OEESC) Conference has become the premier forum for presenting new research on the current challenges in the prevention of occupational and environmental dermal exposures.
The OEESC meeting is unique because it brings together experts in dermal exposure assessment, clinical dermatology, and skin toxicology with policy-makers as well as health, safety and environment professionals interested in increasing their knowledge of dermal exposure issues.
The focus of OEESC has, and continues to be, the science of skin exposure to chemicals. This includes the measurement and modeling of exposure, as well as uptake and absorption of chemicals with a focus on identifying knowledge gaps, future challenges and implications for policy initiatives that will better control exposures.
On behalf of the OEESC 2011 Organizing and Scientific Committees and our Supporters, we extend an invitation for you to join us in Toronto, Canada from June 5-8, 2011.
About OEESC 2011
Since 2002, when the first OEESC was held in Washington, D.C., there has been significant advancement in the knowledge and awareness of occupational and environmental dermal exposures. The OEESC conferences, with their multidisciplinary approach and international perspectives, have contributed substantially to knowledge exchange between researchers and practitioners around the world.
As noted at the last OEESC 2009 in Edinburgh, Scotland, the OEESC conferences have helped to foster discussion and promulgate the science associated with occupational and environmental exposure of skin to chemicals.
A significant majority of our discussion and debates have been centered on the mechanisms associated with skin disease development, hazard identification, risk assessment, exposure measurement and exposure modeling. Participants at OEESC 2009 suggested that the time was right to increase the focus on exposure control, early detection of skin diseases and workplace management of existing disease that arises from occupational and environmental exposure of skin to chemicals.
In addition to the core themes, areas for discussion identified at OEESC 2009 in Edinburgh included:
Approaches for stopping the contaminant spread away from the source (eg., key controls at source including the normalization of “Safe Working Distance: (SWD), practical methods for behavioural changes, visual indicators for spread, etc.)
Research and development of skin exposure control measures other than gloves
Approaches for effective delivery of control messages (eg., maximizing control information on material safety data sheets, explicit inclusion in law, similar to inhalation exposure control, improving knowledge transfer etc.)
An Emerging Theme . . .
Many allergens in the workplace continue to cause both allergic contact dermatitis (OACD) and occupational allergic asthma (OAA). In order to prevent OACD and OAA we need to understand both the host factors and environmental factors that lead to their development. Traditionally, research related to OACD and OAA has been done in organ system silos, with the work focusing on either lung disease or skin disease, but rarely the two together. Further, the research that has been done has tended to focus on causative agents, diagnosis and outcomes of these diseases. Less emphasis has been placed on prevention strategies and activities that are needed if the incidence of these occupational allergic diseases is to be significantly reduced. With OEESC 2011, we see an exciting opportunity to blur the organ system boundaries and examine host and environmental factors that may lead to both OACD and OAA with the ultimate aim of improved prevention strategies. In addition, cancers related to occupational and environmental exposures to the skin are also an area of interest.
In summary, OEESC 2011 will provide an opportunity for researchers and practitioners and trainees from around the world to share recent findings and exchange accumulated knowledge in the field.
The call for abstracts is open and the deadline has been extended to December 15, 2010. Visit the Abstracts tab above for more information.
If you want to be notified when more information becomes available, please enter your name and email in the boxes on the right hand side.
We look forward to seeing you in Toronto, Canada in June 2011!